KLA-TENCOR introduces PLASMAVOLT X2 on the effect of ion chamber of using for measuring etc.
KLA-Tencor Company put out PlasmaVolt X2 a few days ago, can use for in semi-conductive the intersection of wafer and state of ion chamber of measuring etc. under processing system. Because of increasing the inner embedded sensor quantity, and the spatial resolution is improved, PlasmaVolt X2 change to various parameters is extremely sensitive, such as the radio frequency (RF) Power, air current, magnetic field and designing when the ion chamber. Like this and plasma mating, machine examining, systematic trouble removal and craft development of ion chamber of measuring by behavior and the characterization system can be improved in the production environment etc..
SensArray divisional senior vice-president and concurrently chief manager Larry Wagner of KLA-Tencor show: " PlasmaVolt X2 is SensorWafer&trade to us; The important supplement of the series, now, the engineer can get uniquly in the plasma indoor, and the fingerprint characteristic of wafer-grade correlated to plasma effect. PlasmaVolt X2 is a plasma state measuring way of the only usable wafer-grade now. "
The etched engineer of today faces matching the etching chamber, in order to obtain the severe challenge of unanimous characteristic in the whole tool is collected, but etch the characteristicking depends on the control on numerous technological parameterses, including plasma even mode. As the semi-conductive trade moves to the advanced design rule, the process for preparing is shortened continuously at time window, the slight change of the ion pair parameter is more and more sensitive that this lets,etc.. At present, need to measure and etch rate and even mode thick and fast on the goods in process or sample wafer, it is up to 12 hours that this procedure may be long. Under the situation of other steps in the engineer is unable to see that etch arrays, this kind of wafer tests that only produces a result in order to etch the procedure entirely.
Ion chambers such as PlasmaVolt X2 measurable quantity,etc. were hit " The wafer is had " Effect, offer, etch detailed information behavioral about plasma in the procedure while being whole. Can receive the result immediately after measurement, obtaining consequential time shortens several hours. There is these information of ion chamber such as being intact, etching engineers can compare the whole ion chamber such as being inner of wafer factory now, and carry on essential craft adjustment. Control in the machine, machine examining and craft development and application, PlasmaVolt X2 matches PlasmaTemp G4 that KLA-Tencor designed for thermometry specially, becomes the best tool shining upon the ion chamber such as being intact effectively.