Electron Beam Lithography Anti Charging Agent
DisCharge is an anti-charging compound used in electron-beam lithography to avoid charge accumulation on electrically isolated substrates. DisCharge has been shown to decrease charge accumulation on insulating substrates such as fused silica bits, glass slides, and PDMS for positive resists. Discharge is a water-based product that may be readily washed away with water or IPA. Discharge H2O comes in regular (1X), 2X, and 4X formulations, with film thickness doubling and sheet thickness reducing correspondingly as concentration increases. Exposing over an electrically insulating substrate can accumulate charge, which will make a significant impact on the beam's positional accuracy, resulting in poor lithography.