Dischem-INC

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Substrate Cleaning In Precision Optics

Before applying a coating technique, cleaning the substrate is crucial in precision optics and its surfaces. Any surface pollution reduces the adherence of the coating and causes flaws. Contamination, such as dust and water, can impair and modify the function of the optics. When paired with high laser power, particles on the lens surface scatter light and cause heat reactions that might cause lens damage. Whether on a coating or the substrate surface, Contaminants can absorb laser energy.

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Choose the Best Optical Disc Stamper

An Optical disc stamper uses a red or blue laser to record and read data. The majority of optical disks on the market today are flat, round, and 12 centimeters in diameter. The data is stored on the disk as nanoscale data pits and lands. The pits are engraved into a recording material's reflective layer. The lands are the flat, undulating landscapes that surround the pits. The sort of material utilized for the recording is determined by how the disk will be used.

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HMDS Photoresist Adhesion: The Importance of Photolithography Process

HMDS Photoresist Adhesion applies a light-sensitive material to a substrate, usually a silicon wafer, and then exposes it to ultraviolet light. This exposure creates a chemical reaction that changes the physical properties of the photoresist, making it more or less soluble in certain chemicals.

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Electron Beam Lithography Service

If you do not have is opropyl alcohol, you can use white vinegar or rubbing alcohol. Do not use tap water, as it may contain contaminants that can damage the disc's surface. https://disqus.com/by/disqus_CtwNdggIXi/about/

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How Is Electron Beam Lithography Used In Nanotechnology?

Electron beam lithography is a process of creating exact patterns on a surface by firing a narrowly focused beam of electrons at it. This technique is used in nanotechnology to create the possible minor structures, often less than one-millionth of a meter in size.

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4 Facts About EBL Charge Dissipation in Lithography You Need to Know

In lithography, exposing an image onto a photosensitive surface is critical in manufacturing semiconductors and integrated circuits.One of the main factors that determine how well an image can be reproduced is the dissipation of electrostatic charge (EBL) from the surface. This article will discuss ten facts about EBL charge dissipation in lithography that you need to know.

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Electron Beam Lithography in Nanotechnology

It is an active agent used to remove water stains, residues, static electric charges, and optoelectronic substrates. The process is done by reinforcing it with a negative tone electron beam resist, which attracts our cationic agent. Our method eases the residue removal process.

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Photolithography and electron beam lithography

Dischem Inc.'s photolithography and electron beam lithography systems are the most advanced in the world. Our products are used by leading manufacturers to create semiconductors, integrated circuits, MEMS (micro-electro-mechanical systems), and other advanced electronic devices. Our products are reliable, accurate, and easy to use, making them the perfect choice for any application. We can help you with your next big project! Call us now for the best, guaranteed nanotechnology solutions.

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Electroplating Process Nickel Sulfamate

If you're looking for an electroplating process with nickel sulfamate that is reliable and efficient, look no further than Discheminc. Our process is perfect for a variety of applications, from jewelry to electronic components. We use the latest technology to ensure that your products are plated with the highest quality finish possible. With our process, you can rest assured that your products and services will have a long-lasting, durable finish.

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Describe Positive Photoresist Material

A photoresist is a light-sensitive compound used in photolithography and photoengraving. You can remove positive photoresists by focusing UV light on the target material. Depending on the chemical properties of the resist material, the photoresist may become more or less soluble when exposed to light. They're made up of a polymer, a sensitizer, and a solvent, and they're light-sensitive. Each element serves a specific purpose. When a polymer is exposed to radiation, it changes its structure. Visit to know more. https://discheminc.com/photoresist/

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Electron Beam Lithography Anti Charging Agent

DisCharge is an anti-charging compound used in electron-beam lithography to avoid charge accumulation on electrically isolated substrates. DisCharge has been shown to decrease charge accumulation on insulating substrates such as fused silica bits, glass slides, and PDMS for positive resists. Discharge is a water-based product that may be readily washed away with water or IPA. Discharge H2O comes in regular (1X), 2X, and 4X formulations, with film thickness doubling and sheet thickness reducing correspondingly as concentration increases. Exposing over an electrically insulating substrate can accumulate charge, which will make a significant impact on the beam's positional accuracy, resulting in poor lithography.