Aims of Electron Beam Lithography
Like photolithography, electron beam lithography aims to create structures within the resist transferred to the substrate. The benefit of this process is the ability to draw custom patterns with sub-10 nm resolution. In addition, the systems applications are centralized around expensive writing systems, ranging at nearly$1million. The designs are classified not only through the shape of the beam but also through the beam deflection strategy utilized. https://discheminc.com/e-beam-lithography-anti-charging-agents/











